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  • IEC 62374:2007

    Current The latest, up-to-date edition.

    Semiconductor devices - Time dependent dielectric breakdown (TDDB) test for gate dielectric films

    Available format(s):  Hardcopy, PDF, PDF 3 Users, PDF 5 Users, PDF 9 Users

    Language(s):  English - French

    Published date:  29-03-2007

    Publisher:  International Electrotechnical Committee

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    Table of Contents - (Show below) - (Hide below)

    FOREWORD
    1 Scope
    2 Terms and definitions
    3 Test equipment
    4 Test samples
      4.1 General
      4.2 Test structure: capacitor structure
      4.3 Area
    5 Procedures
      5.1 General
      5.2 Pre-test
      5.3 Test conditions
      5.4 Criteria
    6 Lifetime estimation
      6.1 General
      6.2 Acceleration model
      6.3 A procedure for a lifetime estimation
    7 Lifetime dependence on gate oxide area
    Annex A (informative) Supplementary determining test
                          condition and data analysis
    Bibliography

    Abstract - (Show below) - (Hide below)

    Provides a test method of Time Dependent Dielectric Breakdown(TDDB) for gate dielectric films on semiconductor devices and a product lifetime estimation method of TDDB failure

    General Product Information - (Show below) - (Hide below)

    Committee TC 47
    Development Note Stability Date: 2020. (09/2017)
    Document Type Standard
    Publisher International Electrotechnical Committee
    Status Current

    Standards Referenced By This Book - (Show below) - (Hide below)

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