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  • NEN-ISO 21466:2020

    Current The latest, up-to-date edition.

    Microbeam analysis - Scanning electron microscopy - Method for evaluating critical dimensions by CD-SEM

    Available format(s):  Hardcopy

    Language(s):  English

    Published date:  01-01-2020

    Publisher:  Netherlands Standards

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    NEN-ISO 21466 specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method.

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    Committee TC 202
    Document Type Standard
    Publisher Netherlands Standards
    Status Current
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