• SEMI F98 : 2005(R2011)

    Current The latest, up-to-date edition.

    GUIDE FOR TREATMENT OF REUSE WATER IN SEMICONDUCTOR PROCESSING

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    Published date:  12-01-2013

    Publisher:  Semiconductor Equipment & Materials Institute

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    Abstract - (Show below) - (Hide below)

    Describes definitional requirements for industrial water systems that reuse water in a semiconductor manufacturing facility. Intends to establish a common basis for developing detailed specifications in subsequent documents concerning design, performance, optimization, and monitoring of such systems.

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    Development Note Not available for sale from ILI, customer to contact SEMI. (02/2005)
    Document Type Standard
    Publisher Semiconductor Equipment & Materials Institute
    Status Current
    Superseded By

    Standards Referencing This Book - (Show below) - (Hide below)

    SEMI E49 : 2017 GUIDE FOR HIGH PURITY AND ULTRAHIGH PURITY PIPING PERFORMANCE, SUBASSEMBLIES, AND FINAL ASSEMBLIES
    SEMI S2 : 2016B ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
    SEMI F63 : 2016 GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING
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