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NA

Status of Standard is Unknown

BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION

Available format(s)

Hardcopy , PDF

Language(s)

English

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FOREWORD
INTRODUCTION
1 Scope
2 Normative references
3 Terms and definitions
4 Coordinate system[12]
5 1-D qualification features[12]
6 2-D qualification features[6]
7 Cross-sectional qualification features[7]
8 Registration accuracy
Bibliography

BS EN 62903-2 Ed.1.

Committee
AMT/9
DocumentType
Draft
Pages
25
PublisherName
British Standards Institution
Status
NA

SEMI P48 : 2010(R2016) SPECIFICATION OF FIDUCIAL MARKS FOR EUV MASK BLANK
SEMI P28 : 1996(R2007) SPECIFICATION FOR OVERLAY-METROLOGY TEST PATTERNS FOR INTEGRATED-CIRCUIT MANUFACTURE
SEMI P36 : 2008(R2013) GUIDE FOR MAGNIFICATION REFERENCE FOR CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM)
SEMI P21 : 1992(R2003) GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT
SEMI P24 : 1994(R2004) CD METROLOGY PROCEDURES
SEMI P6 : 1988(R2007) SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
SEMI P18 : 1992(R2004) SPECIFICATION FOR OVERLAY CAPABILITIES OF WAFER STEPPERS
SEMI D21 : 2006(R2015) TERMINOLOGY FOR FPD MASK PATTERN ACCURACY
SEMI P19 : 1992(R2007) SPECIFICATION FOR METROLOGY PATTERN CELLS FOR INTEGRATED CIRCUIT MANUFACTURE
SEMI P30 : 1997(R2004) PRACTICE FOR CATALOG PUBLICATION OF CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM)
SEMI P43 : 2004(R2011) PHOTOMASK QUALIFICATION TERMINOLOGY
SEMI P35 : 2006(R2013) TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY
SEMI P47 : 2007(R2013) TEST METHOD FOR EVALUATION OF LINE-EDGE ROUGHNESS AND LINEWIDTH ROUGHNESS

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