14/30317965 DC : 0
NA
Status of Standard is Unknown
BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION
Hardcopy , PDF
English
FOREWORD
INTRODUCTION
1 Scope
2 Normative references
3 Terms and definitions
4 Coordinate system[12]
5 1-D qualification features[12]
6 2-D qualification features[6]
7 Cross-sectional qualification features[7]
8 Registration accuracy
Bibliography
BS EN 62903-2 Ed.1.
| Committee |
AMT/9
|
| DocumentType |
Draft
|
| Pages |
25
|
| PublisherName |
British Standards Institution
|
| Status |
NA
|
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| SEMI P36 : 2008(R2013) | GUIDE FOR MAGNIFICATION REFERENCE FOR CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM) |
| SEMI P21 : 1992(R2003) | GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT |
| SEMI P24 : 1994(R2004) | CD METROLOGY PROCEDURES |
| SEMI P6 : 1988(R2007) | SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS |
| SEMI P18 : 1992(R2004) | SPECIFICATION FOR OVERLAY CAPABILITIES OF WAFER STEPPERS |
| SEMI D21 : 2006(R2015) | TERMINOLOGY FOR FPD MASK PATTERN ACCURACY |
| SEMI P19 : 1992(R2007) | SPECIFICATION FOR METROLOGY PATTERN CELLS FOR INTEGRATED CIRCUIT MANUFACTURE |
| SEMI P30 : 1997(R2004) | PRACTICE FOR CATALOG PUBLICATION OF CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM) |
| SEMI P43 : 2004(R2011) | PHOTOMASK QUALIFICATION TERMINOLOGY |
| SEMI P35 : 2006(R2013) | TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY |
| SEMI P47 : 2007(R2013) | TEST METHOD FOR EVALUATION OF LINE-EDGE ROUGHNESS AND LINEWIDTH ROUGHNESS |
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