ASTM E 1162 : 1987 : R1996
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
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Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
Hardcopy , PDF
11-11-2014
English
24-04-1987
Important note : Users cannot be edited or removed once added to your Multi user PDF.| Committee |
E 42
|
| DocumentType |
Standard Practice
|
| Pages |
3
|
| ProductNote |
Reconfirmed 1996
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Superseded
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| SupersededBy |
1.1 This practice covers the information needed to describe and report instrumentation, specimen parameters, experimental conditions, and data reduction procedures. SIMS sputter depth profiles can be obtained using a wide variety of primary beam excitation conditions, mass analysis, data acquisition, and processing techniques (1-4).
1.2 Limitations—This practice is limited to conventional sputter depth profiles in which information is averaged over the analyzed area in the plane of the specimen. Ion microprobe or microscope techniques permitting lateral spatial resolution of secondary ions within the analyzed area, for example, image depth profiling, are excluded.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
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