ASTM E 1438 : 2011 : REDLINE
Current
The latest, up-to-date edition.
Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
English
01-11-2011
Important note : Users cannot be edited or removed once added to your Multi user PDF.CONTAINED IN VOL. 03.05, 2015 Defines the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens (both organic and inorganic).
| Committee |
E 42
|
| DocumentType |
Redline
|
| Pages |
3
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Current
|
1.1 This guide provides the SIMS analyst with a method for determining the width of interfaces from SIMS sputtering data obtained from analyses of layered specimens. This guide does not apply to data obtained from analyses of specimens with thin markers or specimens without interfaces such as ion-implanted specimens.
1.2 This guide does not describe methods for the optimization of interface width or the optimization of depth resolution.
This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
| BS ISO 14606:2015 | Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials |
| ISO 14606:2015 | Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials |
| DD ISO/TR 15969:2001 | Surface chemical analysis. Depth profiling. Measurement of sputtered depth |
| ISO/TR 15969:2001 | Surface chemical analysis Depth profiling Measurement of sputtered depth |
| ASTM E 673 : 2003 | Standard Terminology Relating to Surface Analysis (Withdrawn 2012) |
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