ASTM E 2245 : 2011
NA
Status of Standard is Unknown
Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
Hardcopy , PDF
English
01-11-2011
Important note : Users cannot be edited or removed once added to your Multi user PDF.| Committee |
E 08
|
| DocumentType |
Test Method
|
| Pages |
24
|
| PublisherName |
American Society for Testing and Materials
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| Status |
NA
|
| SupersededBy | |
| Supersedes |
1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.
1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
| ASTM F 2603 : 2006 : R2012 | Standard Guide for Interpreting Images of Polymeric Tissue Scaffolds |
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