ASTM F 1261M : 1996
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
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Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]
Hardcopy , PDF
11-11-2014
English
31-12-2010
Important note : Users cannot be edited or removed once added to your Multi user PDF.CONTAINED IN VOL. 10.04, 2009 Determines the average electrical width of a narrow thin-film metallization line. This is meant for measuring thin metallization lines such as are used in microelectronic circuits where the width of the lines can range from micrometers to tenths of micrometers.
| Committee |
F 01
|
| DocumentType |
Test Method
|
| Pages |
4
|
| ProductNote |
Reconfirmed 1996
|
| PublisherName |
American Society for Testing and Materials
|
| Status |
Superseded
|
| SupersededBy |
1.1 This test method is designed for determining the average electrical width of a narrow thin-film metallization line.
1.2 This test method is intended for measuring thin metallization lines such as are used in microelectronic circuits where the width of the lines may range from micrometres to tenths of micrometres.
1.3 The test structure used in this test method may be measured while still part of a wafer, or part therefrom, or as part of a test chip bonded to a package and electrically accessible by means of package terminals.
1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
| ASTM F 1260 : 1989 | Test Method for Estimating Electromigration Median Time-To-Failure and Sigma of Integrated Circuit Metallizations |
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