BS ISO 10110-19:2015
Current
The latest, up-to-date edition.
Optics and photonics. Preparation of drawings for optical elements and systems General description of surfaces and components
Hardcopy , PDF
English
31-07-2015
Foreword
1 Scope
2 Normative references
3 Terms and definitions
4 Referencing
5 Drawing specifications
6 Data exchange
7 Data reduction
Annex A (informative) - Mathematical description,
data formats, and data reduction
Bibliography
Defines the presentation of design and functional requirements for optical elements and systems in technical drawings used for manufacture and inspection. Gives a general method of describing surfaces and components.
| Committee |
CPW/172
|
| DevelopmentNote |
Supersedes 13/30253349 DC. (08/2015)
|
| DocumentType |
Standard
|
| Pages |
22
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
| Supersedes |
| Standards | Relationship |
| ISO 10110-19:2015 | Identical |
| ISO 10110-14:2007 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 14: Wavefront deformation tolerance |
| ISO 10110-2:1996 | Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 2: Material imperfections — Stress birefringence |
| ISO 10110-10:2004 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 10: Table representing data of optical elements and cemented assemblies |
| ISO 10110-5:2015 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances |
| ISO 5459:2011 | Geometrical product specifications (GPS) — Geometrical tolerancing — Datums and datum systems |
| ISO 10110-9:2016 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 9: Surface treatment and coating |
| IEC 62050:2005 | VHDL Register Transfer Level (RTL) synthesis |
| IEEE 1076.6-2004 | IEEE Standard for VHDL Register Transfer Level (RTL) Synthesis |
| ISO/TR 14999-2:2005 | Optics and photonics — Interferometric measurement of optical elements and optical systems — Part 2: Measurement and evaluation techniques |
| ISO 10110-4:1997 | Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 4: Material imperfections — Inhomogeneity and striae |
| ISO 10110-17:2004 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold |
| ISO 1101:2017 | Geometrical product specifications (GPS) — Geometrical tolerancing — Tolerances of form, orientation, location and run-out |
| IGES : VERSION 5.3 | INITIAL GRAPHIC EXCHANGE SPECIFICATION |
| ISO 10110-8:2010 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 8: Surface texture; roughness and waviness |
| ISO 10110-6:2015 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 6: Centring tolerances |
| ISO 10110-3:1996 | Optics and optical instruments — Preparation of drawings for optical elements and systems — Part 3: Material imperfections — Bubbles and inclusions |
| ISO 10110-12:2007 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 12: Aspheric surfaces |
| ISO 13584-42:2010 | Industrial automation systems and integration — Parts library — Part 42: Description methodology: Methodology for structuring parts families |
| ISO 10110-1:2006 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 1: General |
| ISO 25297-1:2012 | Optics and photonics — Electronic exchange of optical data — Part 1: NODIF information model |
| ISO 10110-7:2017 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 7: Surface imperfections |
| ISO 10110-11:2016 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 11: Non-toleranced data |
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