BS ISO 14237:2010
Current
The latest, up-to-date edition.
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Hardcopy , PDF
English
31-08-2010
Foreword
Introduction
1 Scope
2 Normative references
3 Principle
4 Reference materials
5 Apparatus
6 Specimen
7 Procedure
8 Expression of results
9 Test report
Annex A (informative) - Determination of carrier density
in silicon wafer
Annex B (informative) - Boron isotope ratio measured by
SIMS
Annex C (normative) - Procedures for evaluation of
apparatus performance
Annex D (informative) - Statistical report on
interlaboratory test programme
Bibliography
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