DIN ISO 10110-19:2016-04
Current
Current
The latest, up-to-date edition.
OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 19: GENERAL DESCRIPTION OF SURFACES AND COMPONENTS (ISO 10110-19:2015)
Available format(s)
Hardcopy , PDF
Language(s)
German, English
Published date
01-04-2016
Committee |
ISO/TC 172
|
DevelopmentNote |
Supersedes DIN 58174. (06/2015)
|
DocumentType |
Standard
|
Pages |
17
|
PublisherName |
German Institute for Standardisation (Deutsches Institut für Normung)
|
Status |
Current
|
Supersedes |
Standards | Relationship |
ISO 10110-19:2015 | Identical |
DIN ISO 10110-6:2016-06 | OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 6: CENTRING TOLERANCES (ISO 10110-6:2015) |
DIN ISO 10110-5:2016-04 | OPTICS AND PHOTONICS - PREPARATION OF DRAWINGS FOR OPTICAL ELEMENTS AND SYSTEMS - PART 5: SURFACE FORM TOLERANCES (ISO 10110-5:2015) |
ISO 10110-14:2007 | Optics and photonics Preparation of drawings for optical elements and systems Part 14: Wavefront deformation tolerance |
ISO 10110-2:1996 | Optics and optical instruments Preparation of drawings for optical elements and systems Part 2: Material imperfections Stress birefringence |
ISO 10110-10:2004 | Optics and photonics Preparation of drawings for optical elements and systems Part 10: Table representing data of optical elements and cemented assemblies |
ISO 10110-5:2015 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 5: Surface form tolerances |
ISO 5459:2011 | Geometrical product specifications (GPS) — Geometrical tolerancing — Datums and datum systems |
ISO 10110-9:2016 | Optics and photonics Preparation of drawings for optical elements and systems Part 9: Surface treatment and coating |
IEC 62050:2005 | VHDL Register Transfer Level (RTL) synthesis |
IEEE 1076.6-2004 | IEEE Standard for VHDL Register Transfer Level (RTL) Synthesis |
ISO/TR 14999-2:2005 | Optics and photonics Interferometric measurement of optical elements and optical systems Part 2: Measurement and evaluation techniques |
ISO 10110-4:1997 | Optics and optical instruments Preparation of drawings for optical elements and systems Part 4: Material imperfections Inhomogeneity and striae |
ISO 10110-17:2004 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 17: Laser irradiation damage threshold |
ISO 1101:2017 | Geometrical product specifications (GPS) — Geometrical tolerancing — Tolerances of form, orientation, location and run-out |
ISO 10110-8:2010 | Optics and photonics Preparation of drawings for optical elements and systems Part 8: Surface texture; roughness and waviness |
ISO 10110-6:2015 | Optics and photonics Preparation of drawings for optical elements and systems Part 6: Centring tolerances |
ISO 10110-3:1996 | Optics and optical instruments Preparation of drawings for optical elements and systems Part 3: Material imperfections Bubbles and inclusions |
ISO 10110-12:2007 | Optics and photonics Preparation of drawings for optical elements and systems Part 12: Aspheric surfaces |
ISO 13584-42:2010 | Industrial automation systems and integration — Parts library — Part 42: Description methodology: Methodology for structuring parts families |
ISO 10110-1:2006 | Optics and photonics Preparation of drawings for optical elements and systems Part 1: General |
ISO 25297-1:2012 | Optics and photonics Electronic exchange of optical data Part 1: NODIF information model |
ISO 10110-7:2017 | Optics and photonics — Preparation of drawings for optical elements and systems — Part 7: Surface imperfections |
ISO 10110-11:2016 | Optics and photonics Preparation of drawings for optical elements and systems Part 11: Non-toleranced data |
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