I.S. EN 62047-26:2016
Current
The latest, up-to-date edition.
SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 26: DESCRIPTION AND MEASUREMENT METHODS FOR MICRO TRENCH AND NEEDLE STRUCTURES
Hardcopy , PDF
English
01-01-2016
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National Foreword
FOREWORD
1 Scope
2 Normative references
3 Terms and definitions
4 Description of trench structures in a micrometer scale
5 Description of needle structures in a micrometer scale
6 Measurement method
Annex A (informative) - Examples of measurement for
trench and needle structures in a micrometer scale
Annex B (informative) - Uncertainty in dimensional measurement
Bibliography
Defines descriptions of trench structure and needle structure in a micrometer scale.
| DevelopmentNote |
For CENELEC adoptions of IEC publications, please check www.iec.ch to be sure that you have any corrigenda that may apply. (01/2017)
|
| DocumentType |
Standard
|
| Pages |
70
|
| PublisherName |
National Standards Authority of Ireland
|
| Status |
Current
|
| Standards | Relationship |
| EN 62047-26:2016 | Identical |
| ISO 3274:1996 | Geometrical Product Specifications (GPS) — Surface texture: Profile method — Nominal characteristics of contact (stylus) instruments |
| ISO 129-1:2004 | Technical drawings Indication of dimensions and tolerances Part 1: General principles |
| ISO/IEC Guide 98-3:2008 | Uncertainty of measurement — Part 3: Guide to the expression of uncertainty in measurement (GUM:1995) |
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