ISO 14606:2022
Current
The latest, up-to-date edition.
Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
Hardcopy , PDF , PDF 3 Users , PDF 5 Users , PDF 9 Users
English
21-11-2022
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This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This document is not intended to cover the use of special multilayered systems such as delta doped layers.
| DocumentType |
Standard
|
| Pages |
17
|
| PublisherName |
International Organization for Standardization
|
| Status |
Current
|
| Supersedes |
| Standards | Relationship |
| BS ISO 14606:2022 | Identical |
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