ISO 16531:2013
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
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Surface chemical analysis Depth profiling Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Hardcopy , PDF , PDF 3 Users , PDF 5 Users , PDF 9 Users
22-10-2020
English
16-05-2013
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ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.
| DevelopmentNote |
Supersedes ISO/DIS 16531. (05/2013)
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| DocumentType |
Standard
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| Pages |
18
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| PublisherName |
International Organization for Standardization
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| Status |
Withdrawn
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| SupersededBy |
| Standards | Relationship |
| BS ISO 16531:2013 | Identical |
| PD ISO/TR 18196:2016 | Nanotechnologies. Measurement technique matrix for the characterization of nano-objects |
| ISO/TR 18196:2016 | Nanotechnologies — Measurement technique matrix for the characterization of nano-objects |
| ISO 18115-1:2013 | Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy |
| ISO 14606:2015 | Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials |
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