• ISO 17331:2004/Amd 1:2010

    Current The latest, up-to-date edition.

    Surface chemical analysis Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy Amendment 1

    Available format(s):  Hardcopy, PDF, PDF 3 Users, PDF 5 Users, PDF 9 Users

    Language(s):  English

    Published date:  05-07-2010

    Publisher:  International Organization for Standardization

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