JIS K 0143:2023
Current
Current
The latest, up-to-date edition.
Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
Published date
20-02-2023
Publisher
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| DocumentType |
Standard
|
| PublisherName |
Japanese Standards Association
|
| Status |
Current
|
| Supersedes |
| JIS K 0163:2010 | Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials |
| JIS K 0164:2023 | Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon |
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