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JIS K 0143:2023

Current

Current

The latest, up-to-date edition.

Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

Available format(s)

Hardcopy

Language(s)

Japanese

Published date

20-02-2023

DocumentType
Revision
Pages
22
PublisherName
Japanese Standards Association
Status
Current
Supersedes

JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

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€13.87
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