JIS K 0148:2005
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
Surface chemical analysis -- Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
English
20-03-2005
22-01-2026
This Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 multiplied by 10 to the 10th power atoms/square centimeters to 1 multiplied by 10 to the 14th power atoms/square centimeters; contamination elements with atomic surface densities from 5 multiplied by 10 to the 8th power atoms/square centimeters to 5 multiplied by 10 to the 12th power atoms/square centimeters using a VPD (vapour-phase decomposition) specimen preparation method.
| DocumentType |
Standard
|
| Pages |
26
|
| PublisherName |
Japanese Standards Association
|
| Status |
Withdrawn
|
| Standards | Relationship |
| ISO 14706:2000 | Identical |
Reaffirmed 2014 2005(R2014) [20/10/2014]2005(R2009) [01/10/2009]2005 [20/03/2005]
| JIS B 9920:2002 | Classification of air cleanliness for cleanrooms |
| JIS Z 8402-2:1999 | Accuracy (trueness and precision) of measurement methods and results -- Part 2: Basic method for the determination of repeatability and reproducibility of a standard measurement method |
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