JIS K 0160:2009
Current
Current
The latest, up-to-date edition.
Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
Published date
20-07-2009
Publisher
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| DocumentType |
Standard
|
| PublisherName |
Japanese Standards Association
|
| Status |
Current
|
| Standards | Relationship |
| ISO 17331:2004 | Identical |
2009(R2014) [20/10/2014]2009 [20/07/2009]
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