NEN EN IEC 62047-25 : 2016
Current
Current
The latest, up-to-date edition.
SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 25: SILICON BASED MEMS FABRICATION TECHNOLOGY - MEASUREMENT METHOD OF PULL-PRESS AND SHEARING STRENGTH OF MICRO BONDING AREA
Published date
30-01-2017
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Defines the in-situ testing method to measure the bonding strength of micro bonding area which is fabricated by micromachining technologies used in silicon-based micro- electromechanical system (MEMS).
| DocumentType |
Standard
|
| PublisherName |
Netherlands Standards
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| Status |
Current
|
| Standards | Relationship |
| IEC 62047-25:2016 | Identical |
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