NEN ISO 14237 : 2010
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - DETERMINATION OF BORON ATOMIC CONCENTRATION IN SILICON USING UNIFORMLY DOPED MATERIALS
Published date
12-01-2013
Publisher
Sorry this product is not available in your region.
Defines a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron.
| DocumentType |
Standard
|
| PublisherName |
Netherlands Standards
|
| Status |
Current
|
| Standards | Relationship |
| ISO 14237:2010 | Identical |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.