NEN ISO 14701 : 2011
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - X-RAY PHOTOELECTRON SPECTROSCOPY - MEASUREMENT OF SILICON OXIDE THICKNESS
Published date
12-01-2013
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Defines several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy.
| DocumentType |
Standard
|
| PublisherName |
Netherlands Standards
|
| Status |
Current
|
| Standards | Relationship |
| ISO 14701:2011 | Identical |
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