NEN ISO 14706 : 2001
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - DETERMINATION OF SURFACE ELEMENTAL CONTAMINATION ON SILICON WAFERS BY TOTAL REFLECTION X-RAY FLUORESCENCE (TXRF) SPECTROSCOPY
Published date
12-01-2013
Publisher
Specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.
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