NEN NPR ISO/TR 22335 : 2007
Current
Current
The latest, up-to-date edition.
SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - MEASUREMENT OF SPUTTERING RATE: MESH-REPLICA METHOD USING A MECHANICAL STYLUS PROFILOMETER
Published date
12-01-2013
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Explains a method for determining ion-sputtering rates for depth profiling measurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) where the specimen is ion-sputtered over a region with an area between 0,4 mm[2] and 3,0 mm[2].
| DocumentType |
Standard
|
| PublisherName |
Netherlands Standards
|
| Status |
Current
|
| Standards | Relationship |
| ISO/TR 22335:2007 | Identical |
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