PD ISO/TR 15969:2021
Current
Current
The latest, up-to-date edition.
Surface chemical analysis. Depth profiling. Measurement of sputtered depth
Available format(s)
Hardcopy , PDF
Language(s)
English
Published date
26-03-2021
Publisher
€188.48
Excluding VAT
| Committee |
CII/60
|
| DocumentType |
Standard
|
| Pages |
22
|
| PublisherName |
British Standards Institution
|
| Status |
Current
|
| Supersedes | |
| UnderRevision |
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1nm to 500µm.
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