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PN EN 62047-14 : 2012

Current

Current

The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 14: FORMING LIMIT MEASURING METHOD OF METALLIC FILM MATERIALS

Published date

12-01-2013

Specifies definitions and procedures for measuring the forming limit of metallic film materials with a thickness range from 0,5 micrometer to 300 micrometers.

Committee
TC 60
DocumentType
Standard
PublisherName
Polish Committee for Standardization
Status
Current

Standards Relationship
IEC 62047-14:2012 Identical
EN 62047-14:2012 Identical

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