SEMI 3D6 : 2013
Current
Current
The latest, up-to-date edition.
GUIDE FOR CMP AND MICRO-BUMP PROCESSES FOR FRONTSIDE THROUGH SILICON VIA (TSA) INTEGRATION
Published date
09-10-2013
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Gives a generic middle-end process flow to define acceptable TSV and CMP quality criteria as well as to develop methodology and measuring procedures for micro-bump.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (09/2013)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
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