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SEMI 3D6 : 2013

Current

Current

The latest, up-to-date edition.

GUIDE FOR CMP AND MICRO-BUMP PROCESSES FOR FRONTSIDE THROUGH SILICON VIA (TSA) INTEGRATION

Published date

09-10-2013

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Gives a generic middle-end process flow to define acceptable TSV and CMP quality criteria as well as to develop methodology and measuring procedures for micro-bump.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (09/2013)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY

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