SEMI C3.22 : 2000
Withdrawn
A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.
STANDARD FOR OXYGEN (O2), BULK LIQUID, 99.5% QUALITY
01-11-2004
12-01-2013
Suppliers recognizing the importance of impurity content of gases in the manufacture of semiconductors, responded by introducing products with improved analytical characterization, notably for trace impurities. The following criteria was considered when determining the defined analytical method: Ease of Use; Accuracy; Reliability; Precision; Maintenance; Versatility; Sensitivity; and Availability of Equipment. Specification is specific to Oxygen (O2), Bulk Liquid 99.5% Quality - used in the processing and manufacture of semiconductors etc. Gas complying with the specifications will commonly contain more of the major component than the minimum permissible limit or contain less of an impurity (or several impurities) than the SEMI C3 maximum permissible limit.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Withdrawn
|
| ASTM F 1239 : 2002 | Standard Test Methods for Oxygen Precipitation Characterization of Silicon Wafers by Measurement of Interstitial Oxygen Reduction (Withdrawn 2003) |
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