• SEMI C93 : 2017

    Superseded A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

    GUIDE FOR DETERMINING THE QUALITY OF ION EXCHANGE RESIN USED IN POLISH APPLICATIONS OF ULTRAPURE WATER SYSTEM

    Available format(s): 

    Superseded date:  05-10-2020

    Language(s): 

    Published date:  08-03-2016

    Publisher:  Semiconductor Equipment & Materials Institute

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    Abstract - (Show below) - (Hide below)

    Specifies a Guide for analysis of virgin high-purity ion exchange (HPIX) resin suitable for use in ultrapure water (UPW) polish applications.

    General Product Information - (Show below) - (Hide below)

    Development Note Not available for sale from ILI, customer to contact SEMI. (02/2016)
    Document Type Standard
    Publisher Semiconductor Equipment & Materials Institute
    Status Superseded
    Superseded By

    Standards Referenced By This Book - (Show below) - (Hide below)

    SEMI F63 : 2016 GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING

    Standards Referencing This Book - (Show below) - (Hide below)

    SEMI E49 : 2017 GUIDE FOR HIGH PURITY AND ULTRAHIGH PURITY PIPING PERFORMANCE, SUBASSEMBLIES, AND FINAL ASSEMBLIES
    SEMI S2 : 2016B ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT
    SEMI F63 : 2016 GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING
    SEMI F40-0699E(R2018) PRACTICE FOR PREPARING LIQUID CHEMICAL DISTRIBUTION COMPONENTS FOR CHEMICAL TESTING
    SEMI F61 : 2017 GUIDE TO DESIGN AND OPERATION OF A SEMICONDUCTOR ULTRAPURE WATER SYSTEM
    SEMI F104 : 2012 PARTICLE TEST METHOD GUIDE FOR EVALUATION OF COMPONENTS USED IN ULTRAPURE WATER AND LIQUID CHEMICAL DISTRIBUTION SYSTEMS
    SEMI F57 : 2014 SPECIFICATION FOR POLYMER MATERIALS AND COMPONENTS USED IN ULTRA PURE WATER AND LIQUID CHEMICAL DISTRIBUTION SYSTEMS
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