SEMI D21:2006(R2021)
Current
Current
The latest, up-to-date edition.
Terminology for FPD Mask Pattern Accuracy
Available format(s)
Hardcopy
Language(s)
English
Published date
01-02-2021
Important note : Users cannot be edited or removed once added to your Multi user PDF.This Document defines terminology for FPD masks. By this Standard, it is intended that the concepts of terms which should be used at the technical conferences, business discussion, etc. are clarified and that standardization as to masks will be promoted.
| DocumentType |
Standard
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| Pages |
0
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| Supersedes |
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