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SEMI
SEMI F35 : 2004

SEMI F35 : 2004

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The latest, up-to-date edition.

TEST METHOD FOR ULTRA-HIGH PURITY GAS DISTRIBUTION SYSTEM INTEGRATION VERIFICATION USING NON-INVASIVE OXYGEN MEASUREMENT

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Gives a guide for monitoring the integrity of UHP (ultra-high purity) gas distribution systems by finding the ingress of atmospheric oxygen. It is used for protecting semiconductor fabrication processes using the UHP gases, which are liable to contamination by common atmospheric impurities before product yield problems develop. The method differs form SEMI F1 which is an invasive technique for identifying leak sources using a mass spectrometer and helium tracer gas.

DevelopmentNote
Previously designated SEMI E71 (Test method for ultra-high purity gas distribution system integration verification using non-invasive oxygen measurement). Not available for sale from ILI, customer to contact SEMI. (05/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI F1 : 2012 SPECIFICATION FOR LEAK INTEGRITY OF HIGH-PURITY GAS PIPING SYSTEMS AND COMPONENTS

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