SEMI F98 : 2005(R2011)
Current
Current
The latest, up-to-date edition.
GUIDE FOR TREATMENT OF REUSE WATER IN SEMICONDUCTOR PROCESSING
Published date
12-01-2013
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Describes definitional requirements for industrial water systems that reuse water in a semiconductor manufacturing facility. Intends to establish a common basis for developing detailed specifications in subsequent documents concerning design, performance, optimization, and monitoring of such systems.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2005)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SupersededBy |
| SEMI E49 : 2017 | GUIDE FOR HIGH PURITY AND ULTRAHIGH PURITY PIPING PERFORMANCE, SUBASSEMBLIES, AND FINAL ASSEMBLIES |
| SEMI S2 : 2016B | ENVIRONMENTAL, HEALTH, AND SAFETY GUIDELINE FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT |
| SEMI F63 : 2016 | GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING |
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