• There are no items in your cart

SEMI M15 : 1998

Current

Current

The latest, up-to-date edition.

POLISHED WAFER DEFECT LIMITS TABLE FOR SEMI-INSULATING GALLIUM ARSENIDE WAFERS

Published date

12-01-2013

Defines the maximum number of defects, by type, that an acceptable polished Semi-Insulating Gallium Arsenide (GaAs) wafer may exhibit. Document established separately from SEMI M15, in accordance with the latest requirements for the material in advanced applications, covers polished semi-insulating GaAs wafers A defect limits table may also be applicable to conducting GaAs wafers, except for the specification of Light Point Defects (LPD) mentioned hereinafter. "Polished" shall refer to wafers which have a chemical/mechanical or specular chemical finish applied to one side of the wafer, with the backside being as cut and etched, ground and etched, lapped and etched, or polished. Definition of defects is covered in ASTM Practices F 523 and F 154.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M54 : 2004(R2011) GUIDE FOR SEMI-INSULATING (SI) GAAS MATERIAL PARAMETERS

View more information
Sorry this product is not available in your region.

Access your standards online with a subscription

Features

  • Simple online access to standards, technical information and regulations.

  • Critical updates of standards and customisable alerts and notifications.

  • Multi-user online standards collection: secure, flexible and cost effective.