SEMI M52:2021
Current
Current
The latest, up-to-date edition.
Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations
Available format(s)
Hardcopy
Language(s)
English
Published date
01-06-2021
Important note : Users cannot be edited or removed once added to your Multi user PDF.This Guide provides recommendations for specifying scanning surface inspection systems (SSIS) for the 130, 90, 65, 45, 32, 22, 16, 11, 7, and 5 nm technology generations.
| DocumentType |
Revision
|
| Pages |
0
|
| ProductNote |
This standard also refers to - SEMI E1.9
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Supersedes |
Access your standards online with a subscription
Features
-
Simple online access to standards, technical information and regulations.
-
Critical updates of standards and customisable alerts and notifications.
-
Multi-user online standards collection: secure, flexible and cost effective.