SEMI M53:2020
Current
Current
The latest, up-to-date edition.
Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodispere Reference Spheres on Unpatterned Semiconductor Wafer Surfaces
Available format(s)
Hardcopy
Language(s)
English
Published date
01-02-2020
Important note : Users cannot be edited or removed once added to your Multi user PDF.This Practice describes calibration of scanning surface inspection system (SSIS) dark field detector channels so that the SSIS will accurately size polystyrene latex (PSL) spheres deposited on unpatterned polished, epitaxial, or filmed semiconductor wafer surfaces.
| DocumentType |
Standard
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| Pages |
0
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| Supersedes |
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