SEMI M66 : 2010(R2015)
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
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TEST METHOD TO EXTRACT EFFECTIVE WORK FUNCTION IN OXIDE AND HIGH-K GATE STACKS USING THE MIS FLAT BAND VOLTAGE-INSULATOR THICKNESS TECHNIQUE
Superseded date
06-12-2021
Superseded by
Published date
12-01-2013
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Specifies determination of the effective work function of both oxide and high-K gate stacks.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. Also available in CD-ROM. (07/2006) E = Editorially modified to correct an error. (03/2007)
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| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
|
| SupersededBy |
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI MF1153 : 2010(R2015) | TEST METHOD FOR CHARACTERIZATION OF METAL-OXIDE SILICON (MOS) STRUCTURES BY CAPACITANCE-VOLTAGE MEASUREMENTS |
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