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SEMI M85:2020

Current

Current

The latest, up-to-date edition.

Guide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry

Available format(s)

Hardcopy

Language(s)

English

Published date

01-01-2020

€134.60
Excluding VAT

Reduction of surface metal contamination below a concentration in accordance with the ITRS road map is a key issue for silicon wafer quality for most of the leading-edge technology applications.

DocumentType
Guide
Pages
0
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

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