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SEMI MF1366:2008(R2023)
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Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
Available format(s)
Hardcopy
Language(s)
English
Published date
01-10-2023
This Test Method covers the determination of total oxygen concentration in the bulk of single crystal silicon substrates using SIMS.
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