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SEMI MF1771 : 2016

Superseded

Superseded

A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.

View Superseded by

TEST METHOD FOR EVALUATING GATE OXIDE INTEGRITY BY VOLTAGE RAMP TECHNIQUE

Superseded date

09-12-2021

Superseded by

SEMI MF1771:2016(R2021)

Published date

12-01-2013

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Pertains to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2004)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Superseded
SupersededBy

SEMI M60 : 2014 TEST METHOD FOR TIME DEPENDENT DIELECTRIC BREAKDOWN CHARACTERISTICS OF SIO[2] FILMS FOR SI WAFER EVALUATION
SEMI M51 : 2012 TEST METHOD FOR CHARACTERIZING SILICON WAFER BY GATE OXIDE INTEGRITY

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI M51 : 2012 TEST METHOD FOR CHARACTERIZING SILICON WAFER BY GATE OXIDE INTEGRITY

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