SEMI MF1771:2016(R2021)
Current
Current
The latest, up-to-date edition.
Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique
Available format(s)
Hardcopy
Language(s)
English
Published date
01-11-2021
Important note : Users cannot be edited or removed once added to your Multi user PDF.The technique outlined in this Test Method is meant to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.
| DocumentType |
Test Method
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| Pages |
0
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| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Supersedes |
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