SEMI MF1771:2016(R2021)
Current
Current
The latest, up-to-date edition.
Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique
Available format(s)
Hardcopy
Language(s)
English
Published date
01-11-2021
€125.00
Excluding VAT
The technique outlined in this Test Method is meant to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.
| DocumentType |
Test Method
|
| Pages |
0
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Supersedes |
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