SEMI MF374:2012(R2023)
Current
The latest, up-to-date edition.
Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure
Hardcopy
English
01-10-2023
Important note : Users cannot be edited or removed once added to your Multi user PDF.This Test Method covers the direct measurement of the average sheet resistance of thin layers of silicon formed by epitaxy, diffusion, or implantation onto or below the surface of a circular silicon wafer having the opposite conductivity type from the thin layer to be measured or by the deposition of polysilicon over an insulating layer.
| DocumentType |
Test Method
|
| Pages |
0
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Supersedes |
| SEMI MF525:2012(R2023) | Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe |
| SEMI MF525:2012(R2018) | Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe |
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