SEMI MF674 : 2016
Current
Current
The latest, up-to-date edition.
PRACTICE FOR PREPARING SILICON FOR SPREADING RESISTANCE MEASUREMENTS
Published date
12-01-2013
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Contains the surface preparation of silicon samples using diamond polishing prior to measurement of resistivity variations by the spreading resistance technique.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (02/2005)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| BS ISO 14237:2010 | Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials |
| SEMI MF672 : 2007 | TEST METHOD FOR MEASURING RESISTIVITY PROFILES PERPENDICULAR TO THE SURFACE OF A SILICON WAFER USING A SPREADING RESISTANCE PROBE |
| ISO 14237:2010 | Surface chemical analysis Secondary-ion mass spectrometry Determination of boron atomic concentration in silicon using uniformly doped materials |
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
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