SEMI P10 : 2012
Current
The latest, up-to-date edition.
SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS
12-01-2013
Use to facilitate the transmittal of mask order data between software systems to allow: - automated order placement by mask customers and to allow the automatic processing of such orders by mask shops, and - automated delivery of actual mask results and qualification data by mask shops and to allow the automatic processing of such data by mask customers.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| SEMI P46 : 2011 | SPECIFICATION FOR CRITICAL DIMENSION (CD) MEASUREMENT INFORMATION DATA ON PHOTOMASK BY XML |
| SEMI P43 : 2004(R2011) | PHOTOMASK QUALIFICATION TERMINOLOGY |
| SEMI P21 : 1992(R2003) | GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT |
| SEMI P24 : 1994(R2004) | CD METROLOGY PROCEDURES |
| SEMI P37 : 2013 | SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS |
| SEMI P6 : 1988(R2007) | SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS |
| SEMI P38 : 2003 | SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS |
| SEMI P5 : 2016 | SPECIFICATION FOR PELLICLES |
| SEMI P2 : 2008 | SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS |
| SEMI P4 : 1992(R1999) | SPECIFICATION FOR ROUND QUARTZ PHOTOMASK SUBSTRATES |
| SEMI P22 : 2007 | GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION |
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
| SEMI P39 : 2016 | SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD |
| SEMI P43 : 2004(R2011) | PHOTOMASK QUALIFICATION TERMINOLOGY |
| SEMI P35 : 2006(R2013) | TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY |
| SEMI P29 : 2011 | SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS |
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