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SEMI P10 : 2012

SEMI P10 : 2012

Current

Current

The latest, up-to-date edition.

SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Use to facilitate the transmittal of mask order data between software systems to allow: - automated order placement by mask customers and to allow the automatic processing of such orders by mask shops, and - automated delivery of actual mask results and qualification data by mask shops and to allow the automatic processing of such data by mask customers.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI P46 : 2011 SPECIFICATION FOR CRITICAL DIMENSION (CD) MEASUREMENT INFORMATION DATA ON PHOTOMASK BY XML
SEMI P43 : 2004(R2011) PHOTOMASK QUALIFICATION TERMINOLOGY

SEMI P21 : 1992(R2003) GUIDELINES FOR PRECISION AND ACCURACY EXPRESSION FOR MASK WRITING EQUIPMENT
SEMI P24 : 1994(R2004) CD METROLOGY PROCEDURES
SEMI P37 : 2013 SPECIFICATION FOR EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES AND BLANKS
SEMI P6 : 1988(R2007) SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
SEMI P38 : 2003 SPECIFICATION FOR ABSORBING FILM STACKS AND MULTILAYERS ON EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS
SEMI P5 : 2016 SPECIFICATION FOR PELLICLES
SEMI P2 : 2008 SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS
SEMI P4 : 1992(R1999) SPECIFICATION FOR ROUND QUARTZ PHOTOMASK SUBSTRATES
SEMI P22 : 2007 GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION
SEMI P1 : 2008E SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES
SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD
SEMI P43 : 2004(R2011) PHOTOMASK QUALIFICATION TERMINOLOGY
SEMI P35 : 2006(R2013) TERMINOLOGY FOR MICROLITHOGRAPHY METROLOGY
SEMI P29 : 2011 SPECIFICATION FOR CHARACTERISTICS SPECIFIC TO ATTENUATED PHASE SHIFT MASKS AND MASKS BLANKS

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