SEMI P23 : 2000(R2007)
Current
Current
The latest, up-to-date edition.
GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS
Published date
12-01-2013
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Describes a test mask to be used for evaluation of the sensitivity of Mask Defect Inspection Systems. Also describes the content and methods for use of test masks used in the evaluation of mask defect inspection systems.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (10/2007)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P22 : 2007 | GUIDELINE FOR PHOTOMASK DEFECT CLASSIFICATION AND SIZE DEFINITION |
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
| SEMI P33 : 1998 | PROVISIONAL SPECIFICATION FOR DEVELOPMENT 230 MM SQUARE HARD SURFACE PHOTOMASK SUBSTRATES |
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