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SEMI P23 : 2000(R2007)

SEMI P23 : 2000(R2007)

Current

Current

The latest, up-to-date edition.

GUIDELINE FOR PROGRAMMED DEFECT MASKS AND BENCHMARK PROCEDURES FOR SENSITIVITY ANALYSIS OF MASK DEFECT INSPECTION SYSTEMS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes a test mask to be used for evaluation of the sensitivity of Mask Defect Inspection Systems. Also describes the content and methods for use of test masks used in the evaluation of mask defect inspection systems.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (10/2007)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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