SEMI P25 : 1994(R2004)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR MEASURING DEPTH OF FOCUS AND BEST FOCUS
Published date
12-01-2013
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Provides a common descriptive vocabulary and outline of basic technique for use by photolithographers in the IC industry to gauge and report the depth of focus, astigmatism and field curvature of IC photolithographic instruments.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| Standards | Relationship |
| SAC GB/T 17865 : 1999 | Identical |
| SEMI P19 : 1992(R2007) | SPECIFICATION FOR METROLOGY PATTERN CELLS FOR INTEGRATED CIRCUIT MANUFACTURE |
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