SEMI P28 : 1996(R2007)
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR OVERLAY-METROLOGY TEST PATTERNS FOR INTEGRATED-CIRCUIT MANUFACTURE
Published date
12-01-2013
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Describes several standard overlay metrology patterns which are used by metrology equipment users to evaluate and test micropatterning equipment and processes in integrated circuit (IC) manufacturing.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (06/2007)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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