SEMI P3 : 2008
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR PHOTORESIST/E-BEAM RESIST FOR HARD SURFACE PHOTOPLATES
Published date
12-01-2013
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Describes the general requirements on the photoresist and e-beam resist coating for hard surface photoplates.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (03/2008)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P2 : 2008 | SPECIFICATION FOR CHROME THIN FILMS FOR HARD SURFACE PHOTOMASKS |
| SEMI P1 : 2008E | SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES |
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