SEMI P36 : 2008(R2013)
Current
Current
The latest, up-to-date edition.
GUIDE FOR MAGNIFICATION REFERENCE FOR CRITICAL DIMENSION MEASUREMENT SCANNING ELECTRON MICROSCOPES (CD-SEM)
Published date
12-01-2013
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Provides guidelines: - to define common and important specifications of magnification references which are used for calibrating magnifications of critical dimension measurement scanning electron microscopes (CD-SEMs), and as the result; - to provide magnification references which are easy for anyone to use.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (03/2008)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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BS IEC 62899-301-2:2017 | Printed electronics Equipment. Contact printing. Rigid master. Measurement method of plate master pattern dimension |
SEMI P47 : 2007(R2013) | TEST METHOD FOR EVALUATION OF LINE-EDGE ROUGHNESS AND LINEWIDTH ROUGHNESS |
14/30317965 DC : 0 | BS EN 62903-2 ED.1 - PRINTED ELECTRONICS - EQUIPMENT - CONTACT PRINTING - RIGID MASTER - PART 2: MEASUREMENT METHOD OF PLATE MASTER PATTERN DIMENSION |
IEC 62899-301-2:2017 | Printed electronics - Part 301-2: Equipment - Contact printing - Rigid master - Measurement method of plate master pattern dimension |
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