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SEMI P44 : MAR 2016

SEMI P44 : MAR 2016

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR OPEN ARTWORK SYSTEM INTERCHANGE STANDARD (OASIS [R]) SPECIFIC TO MASK TOOLS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Specifies the common mask data format specifications based on OASIS for mask tools, namely 'OASIS MASK'.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (10/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI P45 : 2011 SPECIFICATION FOR JOB DECK DATA FORMAT FOR MASK TOOLS

SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD

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