SEMI P44 : MAR 2016
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR OPEN ARTWORK SYSTEM INTERCHANGE STANDARD (OASIS [R]) SPECIFIC TO MASK TOOLS
Published date
12-01-2013
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Specifies the common mask data format specifications based on OASIS for mask tools, namely 'OASIS MASK'.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2005)
|
| DocumentType |
Standard
|
| PublisherName |
Semiconductor Equipment & Materials Institute
|
| Status |
Current
|
| SEMI P45 : 2011 | SPECIFICATION FOR JOB DECK DATA FORMAT FOR MASK TOOLS |
| SEMI P39 : 2016 | SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INTERCHANGE STANDARD |
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